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ITRI joins forces with TSMC and NYCU to develop next-gen MRAM technologies

Submitted by Ron Mertens on

Taiwan's Industrial Technology Research Institute (ITRI) announced two new MRAM collaborations. The first one is with Taiwan's TSMC, for the development of SOT-MRAM array chips. The second collaboration is with National Yang Ming Chiao Tung University (NYCU) to develop magnetic memory technology that can perform across a wide operating temperature range of nearly 400 degrees Celsius.

Together with TSMC, ITRI is developing low-voltage and current SOT-MRAM, that features high write efficiecny and low write voltage. ITRI says that its SOT-MRAM achieves a writing speed of 0.4 nanoseconds and a high endurance of 7 trillion reads and writes. The memory also offers a data storage lifespan of over 10 years.

Together with NYCU, ITRI has worked to develop high-efficiency operating technology for MRAM and recently presented the R&D results. The newly developed STT-MRAM adopts ultrathin composite films and magnesium spacers to boost writing speed, reduce latency, minimize writing current, and improve endurance. The multi-functional magnetic memory has optimal data access performance and stability across a wide operating temperature range between -269 and 127 degrees Celsius.

Earlier this year ITRI announced a joint project with UCLA to develop VC-MRAM technologies.