The patent application was filed January 31, 2005 and will help to secure the company in its go forward strategy. This strategy relies on innovations made by the company through the work of Professor Harry Ruda, the University of Toronto and its collaborators. This patent filing encompasses compositions of matter as well as methods of making an MRAM device.

"This most recent filing will serve as a keystone in our patent portfolio as the company places great importance on its patent portfolio strategy. MRAM is undoubtedly a competitive industry and therefore we will continue to pay great attention to securing our business in that space," said the company's CTO, Dr. Cynthia Kuper.

The invention provides Tegal with a unique new PVD source technology for advanced applications in chip manufacturing. Direct benefits of this invention include the capability of providing highly directional deposition of metal atoms and ions, and the easy utilization of magnetic target materials such as Nickel.

Conventional PVD sources are limited by their reliance on strong magnetic fields. This makes sputtering of magnetic materials problematic and inefficient. Nickel films will be needed for contact metal silicide formation at the 45-nanometer "node" of chip manufacturing, and in many of the "lead-free" final packaging schemes. The ability to sputter Nickel and other magnetic materials efficiently also has many benefits for MRAM, thin film heads and a wide variety of MEMS applications.